Edwards STPXA2703C磁悬浮分子泵

Edwards STP-XA2703C Turbomolecular Vacuum Pump - NEW

The STP-XA2703C turbo pump offers high performance in the process range of high vacuum to 2,300 sccm process flow with enhanced throughput for all gases.

This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition.

The outstanding performance is suited to both light and harsh applications, such as semiconductor etch, implant, lithography and LCD processes.

Advanced Rotor Design

• Increased H2, N2 and Ar performance
• Improved performance in the process pressure range of high vacuum to 2,300 sccm
• Maintenance free

5-Axis Magnetic Suspension System

• Zero contamination
• Low vibration

Innovative Torque Management

• Patented torque reduction mechanism

Optimized Temperature Management

• High temperature TMS capability
• Low deposition
• Built-in cooling mechanism
• Higher gas throughput heated and unheated
• Optimized life
• Harsh process compatible

Certifications

• SEMI® compliant, CE Marked and UL Listed

Edwards STP-XA2703C Turbomolecular Vacuum Pump - NEW

P/N YT66-0Z-110 / YT660Z110  STP-XA2703C  VG-250
P/N PT66-0Z-140 / PT660Z140  STP-XA2703C  ISO-250
P/N YT66-10-010 / YT6610010  STP-XA2703C  DN 250 CF

STP-XA2703BV3  CORROSIVE RESISTANT TURBO PUMP WITH TMS, 85 DEG C, 2700 L/S, DN 250 ISO-F INLET, MAXIMUM ARGON THROUGHPUT 2000 SCCM, 5 AXIS ACTIVE MAGNETIC SUSPENSION VIA DIGITAL DISPLAY CONTROLLER,MAXIMUM FORELINE PRESSURE 2.5 TORR, WATER COOLED,  KF10 PURGE PORT, TMS EXTERNAL SENSOR